This work uses a novel approach of combined medium frequency (20 – 350 kHz) asymmetric bipolar pulsed magnetron sputtering (pulsed-DC) and pulsed substrate biasing to reactively deposit Cr2O3 and Al2O3 thin films at substrate temperatures of the order of 100 °C. Usually in such cases, the target and the substrate are pulsed at the same frequency [single-frequency (1F) mode] in either synchronous (master-slave) or asynchronous mode. The latter ... Shared on http://www.vacuumcoating.info
Tags:
Dual , Frequency , Magnetron , Processing , PVD , Reactive , Sputtering , VacuumCoating
By:
vacuumcoat
Science & Technology
6 months ago
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