Nanolithography

Slide 1: 

Franklin Ifeanyichukwu Uba Group meeting Louisiana State University May 3, 2010 Nanolithography

Outline : 

Outline Objective Nanotechnology Nanolithography techniques Reviews Summary Future work Acknowledgement

Objective : 

Objective To provide an overview of selected nano-pattern design techniques – Principles, merits and limitations

Genesis : 

Genesis ‘There is plenty of rooms at the bottom’ ……..APS lecture Dec 29, 1959 Richard Phillips Feynman (1918 – 1988) Physics Nobel laureate (1965) http://www.acceleratingfuture.com/michael/blog/ “…Why can’t we write the entire 24 volumes of the encyclopedia Britannica on the head of a pin ?..” “I don’t know how to do this on a small scale at a practical level,………” “……..by little, I mean little.” Chris Toumey, Apostolic Succession, Engineering & science no. 1 / 2. 2005

Nano stuffs……. : 

Nano stuffs……. Prof. Norio Taniguchi (1912-1999) Tokyo State University http://www.nanoforum.org/educationtree/Images/taniguchi.jpg Prof. George M. Whitesides Harvard University ‘…collective term for a set of technologies, techniques, and processes, rather than a specific science or engineering discipline….’ Coined the word ‘Nanotechnology’. Nanotechnology... ‘a word not a field’. Harvard’s George Whitesides on Nanotechnology: ‘Science Watch,2002 (July/August).

Slide 6: 

Greek Nano = English Dwarf ‘world of the very small things’ http://www.eglobe1.com/word/wpcontent/uploads/2008/05/strongest-dwarf.jpg Scientific discipline attach ‘nano-label’ to become part of nanoscience and nanotech. ‘a Billionth of a meter……10-9 m’

Areas in nanotechnology : 

Areas in nanotechnology Nanoelectronics Nanorobotics Nanomechanics http://compmech.cveg.uark.edu/airplane.gif Nanomedicine Nanomagnetics Nanophotonics Nanobiology Nanomaterials http://www.cl.cam.ac.uk/~sps32/proj_pict/sega_01.jpg http://www.edinformatics.com/nanotechnology/400px-MolecularImagingTherapy.jpg

Slide 8: 

Applications Plasma Displays Quantum Computers Solar Cells Fuel Cells Nano Tubes Aerogel Nano Particles Artificial Retina Targeted Drug Delivery Tissue Regeneration

Nanolithography : 

Nanolithography Fabrication of structures between 1 – 100 nm Properties differ from bulk forms 1-D - Thin films (a few atoms thick), Nano-slits 2-D - Planar transistors, magnetic or photonic elements, Nano-channels 3-D - Nano-particles, Carbon nano-tubes, Nano-wires 2-D is the basic building blocks to form functional nano-devices Evolves from Micro-fabrication http://www.nano.gov/

Methods : 

Methods Photon-Based Lithography Charged beam based lithography Electron beam lithography Ion-Beam lithography Conventional pattern transfer technologies Deposition Reactive-ion etching Un-conventional nanofabrication Scanning probes Replication of stamps Indirect fabrication Self assembly

Slide 11: 

Achievable dimensions Jie-Ren Li, Dissertation, Louisiana State University, May 2009

Photon-based lithography : 

Photon-based lithography Fabrication with photons Deep Ultra violet Extreme Ultraviolet X-rays Photomask (reticle) Photoresist Attwood, D., Soft X-Rays and Extreme Ultraviolet Radiation: Principles and applications. 2000, Cambridge University Press

Slide 13: 

Procedure Spin coating http://britneyspears.ac/physics/fabrication/photolithography.htm

Slide 14: 

Contact Proximity Projection Mask and Resist http://www.patrickcarlberg.dk/images/optical_lithography.jpg

Charged beam based : 

Charged beam based Electron beam (e-beam) or Ion Beam nanofabrication High energy direct or indirect transfer E-beam evolved from SEM – 1960s FIB; Liquid Metal Ion Source (LMIS) – 1980s Z. Cui, Nanofabrication, DOI: 10.1007/978-0-387-75577-9_3 Conditions for High resolution High electron/ion energy Small scanning field Low beam current Low-sensitivity resist Thin resist layer Optimized resist process Low pattern density Light and conductive substrate material Stable environment

E-beam : 

E-beam FIB FEI company, Focused ion beam technology, capabilities and applications, Tools for nanotech, (2005)

Contrasts : 

Contrasts FEI Company, Focused ion beam technology, capabilities and applications, Tools for nanotech, 2005

Other techniques : 

Other techniques

Summary : 

Summary Optical lithography – high throughput technique Diffraction limit Labor intensive Charged particle lith. – Effective milling and deposition Low throughput and expensive High level of expertise Dopant - FIB Other techniques – Achieve smaller dimensions Expensive

Future work : 

Future work Design 2D – Nano-channels; FIB milling Fabricate Metal Electrodes; E-beam deposition Monitor Current blockades from nucleotides

Slide 22: 

Acknowledgement Dr S.A Soper Dr Chantiwas Dr Matt Soper research group

Slide 23: 

Questions

Slide 24: 

‘There is plenty of room…..’