Presentation Transcript
Nano-Machining and Nano-Patterning Using Near-field Optics :Nano-Machining and Nano-Patterning Using Near-field Optics Anargyros (Roger) Panayotopoulos
Professors Greif and Grigoropoulos
Graduate Students- David Hwang
and Anant Chimmalgi
Laser Thermal Laboratory
University of California, Berkeley
February 25, 2002
Why is Nano-Technology Important? :Why is Nano-Technology Important? Current Feature Size ~ 0.25 microns
Applications
Nano-Lithography (Photomask production and repair)
Nano-Machining
High density data storage
Nanophotonic devices
Fabrication of hybrid systems of molecular electronics
Micro/nano surgery (Dentistry, Ophthalmology)
Micro/nano biological technology
Methods to Reach Nanometer Resolutions :Methods to Reach Nanometer Resolutions Electron Beam Lithography
X-ray Lithography
Scanning Tunneling Microscopy (STM)
Atomic Force Microscope (AFM)
Scanning Near-field Optical Microscope (NSOM)
Ultra-fast Laser Ablation (Multi-photon effects)
What Differentiates NSOM? :What Differentiates NSOM? Complicated
Mask Dependence
Preferential Etching
Conductivity
NSOM
Mask-free deposition
Reliable and controllable
Metals, oxides, semi-conductors, insulators
Chemical composition and morphology
PCVD (Photo-Chemical Vapour Deposition) coupling
Far-field and Near-field Optics :Far-field and Near-field Optics Far-field Optics
Geometric optics based on traditional optical element (Lens)
Fails to perform adequately under certain circumstances
Sub-wavelength apertures
Deep UV radiation
Wavelength independence
Ultra-short pulses
Near-field optics
Form of lens-less optics with sub-wavelength resolution
Independent of the wavelength of light being used
Far-field and Near-field Optical Schematics :Far-field and Near-field Optical Schematics
Critical Parameters Defining NSOM :Critical Parameters Defining NSOM Concentration of Light Energy
Nano-metric Dimensions of Light
Electromagnetic Interactions of Tip
Enables Deposition of Various Materials
Photo-decomposition of chemical gases.
Optical Resolutions Beyond the Diffraction Limit
Process Limitations
NSOM Combinational Techniques :NSOM Combinational Techniques NSOM Using Optical Fiber Tips
NSOM/AFM Cantilevered Tips
NSOM Using Micro-machined Apertures
NFO-PCVD
Experimental Setup of NSOM System :Experimental Setup of NSOM System Fiber tip by Nanonics Inc. NSOM Schematic by DI Inc.
NSOM/AFM Cantilever Tip Focusing :NSOM/AFM Cantilever Tip Focusing SiO2 cantilevered tip (Mitsuoka et al. 2000) Waveguide tip (Takashi et al.1999)
Probe Tip and System Control of NSOM :Probe Tip and System Control of NSOM Probe Tips
Receiving/Transmitting Antennas
Tip Distance Control
Beam Deflection Method
Shear Force Measurement
Piezo-Electric Tuning Fork
Cantilever Normal Force Piezo-resistive micro cantilever (Muramatsu et al. 2000)
NSOM Using Optical Fiber Tips :NSOM Using Optical Fiber Tips Force Pulling Fabrication Method Foil-heater Schematic (above), Tips from one pulling step (left) (Gallacchi et al. 2000)
Optical Fiber Tips by Foil Heating :Optical Fiber Tips by Foil Heating Heat pulled fiber tips (Gallacchi et al. 2000)
Fabrication of Cantilevered Tips :Fabrication of Cantilevered Tips Etching/Micro-Machining
E-beam lithography, LPCVD, DRIE
Fabrication Steps
Selective etching
Sacrificial deposit and masking
Metals core coating
Apex removal Fabrication steps for SiO2 tip
(Minh et al. 2000)
Etched Cantilever Tip Images :Etched Cantilever Tip Images Fabrication of Si3N4 cantilever tip (Jung et al. 2000) Topological image of tip radius (Jung et al. 2000)
SEM Micrographs of AFM Tip Profiles :SEM Micrographs of AFM Tip Profiles Tip radius (Jung et al. 2000)
NFO Using Ultra-fast Laser Ablation :NFO Using Ultra-fast Laser Ablation Extremely Fast Energy Deposition
Femto/Pico second time scales
Resulting in Subsequent Material Ablation
Without thermal heat shocks or mechanical damaging (ie. Melting, burr formation, cracks)
Ablation- Rapid Absorption Process :Ablation- Rapid Absorption Process Ablation
Related to direct transmission from solid to gaseous state without liquid phase
Laser energy absorbed (excitation and ionization of material) inside electronic subsystem (lattice) by free electrons by inverse Bremsstrahlung
Bremsstrahlung- Energy lost by electrons that appears as energy radiating away from site
Collision momentum transfer to atom, electron KE losses
NFO-PCVD Patterning Method :NFO-PCVD Patterning Method Utilizes NFO in vacuum
Photo-dissociation NFO-PCVD Schematic (Polonski et al.1999)
NFO-PCVD Pattern Processing :NFO-PCVD Pattern Processing 2 Step Process
a) Pre-nucleation
b) Film Growth NFO-PCVD Process (Polonski et al.1999)
NFO-PCVD Pattern Processing :NFO-PCVD Pattern Processing NFO-PCVD Absorption/Decomposition Mechanism (Ohtsu et al. 2000) Near-field/Far-field Exposure
NFO-PCVD Patterned Resolutions :NFO-PCVD Patterned Resolutions Shear-force image (Polonski et al.1999)
NSOM Transmission Efficiency :NSOM Transmission Efficiency Efficiency (Transmission Throughput)
Scattered light power from the aperture/ input light power
Function of aperture diameter, distance, polarization
Key Considerations for Higher Efficiencies
Tip reproducibility
Reliable distance control and probe handling
Large refractive index
Leads to short effective wavelength inside the probe material resulting in high transmission effect
NSOM Transmission Efficiency of Fiber Tips :NSOM Transmission Efficiency of Fiber Tips Fiber Material- Glass
constant optical properties, thus good for infrared spectroscopy
Intensity strongly dependent on dielectric properties of tip
Typical Transmissions ~10^-4 to 10^-6
Possible Solutions to Decrease Propagation Loss
Multiple tapered probes
Metal coatings
Multi-Tapered Optical Fibers :Multi-Tapered Optical Fibers Probe configuration ~ Intensity Enhancement Electric field of tapered fiber
tip (left), Intensity Plots (right)
(Nakamura et al. 2000)
Transmission Efficiencies of Cantilevered Tips to Fiber Tips :Transmission Efficiencies of Cantilevered Tips to Fiber Tips Excellent optical efficiency/throughput
Transmission efficiencies ~ 10^-2 to 10^-4
Large NA objectives provide high optical throughput, but also means shorter working distance and disturbs optical path
Tip-to-sample Regulation
Normal force deflections of the cantilever
Better control, and easier than other techniques
Flexible and metal coated apertures not damaged after scanning
Probe-to-Probe Intensity Measurement :Probe-to-Probe Intensity Measurement Probe-to-Probe configuration (Ohtsu et al. 2000) Constant Height Mode
Soft/hard substrate ~ rough estimate
NSOM Intensity Distribution :NSOM Intensity Distribution Elliptical Profile Distributions
NFO properties of tip aperture
Asymmetry of the tip
Vibrational effects
Polarization effect Intensity Distribution (Lu et al. 2001) NFO Intensity (Minh et al. 2000)
Photo-Chemical Intensity Measurement :Photo-Chemical Intensity Measurement Analyzing Oxidation Region
2-D Intensity Distribution ~ Photo-Oxidized Region
N(x,y) ~ SS I(u,v)O(x-u,y-v) dudv
O(x,y)~ I(x,y)
>> N(x,y) ~ SS I(u,v)I(x-u,y-v)dudv Contour plot of photo-oxidation region (right), Cross-sectional plots of intensity regions (above) (Wei et al. 1996)
Polarization Effects on Intensity Transmission :Polarization Effects on Intensity Transmission Polarization Effects (Kawashima et al. 2000) Transmission Effect (Kawashima et al. 2000)
Current Research Goals :Current Research Goals Determine Intensity Correlations of Photosensitive Polymers
Designs for Optimal Tip Configurations
Parametric Studies of Material Responses
Studies due to Various Lasers
Femto/pico second laser, Excimer